R.A. Haken - Concepedia

Author

R.A. Haken

Texas Instruments (United States)

Also Known As

R Haken, R. A. HAKEN, R. A. Haken, R. Haken, R.A. Haken, Roger A. Haken

Publications

979

Citations

H-Index

Concepts

All Affiliations

Texas Instruments (United States)Hewlett-Packard (United States)RWTH Aachen University

About

R.A. Haken is an author at Texas Instruments (United States) specializing in engineering, computer engineering, and electrical engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	13	599
2	Applied Physics	7	7	410
3	Medicine	2	2	325
4	Social Sciences	1	1	244
5	Biomedical Engineering	1	1	81

R.A. Haken

Publications

921

Citations

H-Index

Page 1

	Year	Citations
The NMR-mouse: construction, excitation, and applications Bernhard Blümich, Peter Blümler, G. Eidmann, Magnetic Resonance Imaging Magnetic Resonance SpectroscopyComputational NeuroscienceElectron Paramagnetic ResonanceMagnetic ResonanceDynamic Nuclear Polarization	1998	244
Development of the self-aligned titanium silicide process for VLSI applications M.E. Alperin, T.C. Holloway, R.A. Haken, IEEE Transactions on Electron Devices EngineeringVlsi DesignIntegrated CircuitsSilicon On InsulatorStraightforward Polysilicon	1985	137
Anisotropy in Tendon Investigated in Vivo by a Portable NMR Scanner, the NMR-MOUSE R.A. Haken, Bernhard Blümich Journal of Magnetic Resonance Portable Nmr ScannerEngineeringBiomechanicsMagnetic ResonanceTendon Investigated	2000	81
Titanium disilicide contact resistivity and its impact on 1-&#181;m CMOS circuit performance D.B. Scott, R. A. Chapman, C.C. Wei, IEEE Transactions on Electron Devices	1987	78
Development of the Self-Aligned Titanium Silicide Process for VLSI Applications M.E. Alperin, T.C. Hollaway, R.A. Haken, IEEE Journal of Solid-State Circuits EngineeringVlsi DesignPolycide Gate StackSilicon On InsulatorNanoelectronics	1985	77
Application of the self-aligned titanium silicide process to very large-scale integrated <i>n</i>-metal-oxide-semiconductor and complementary metal-oxide-semiconductor technologies R.A. Haken Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena EngineeringVlsi DesignIntegrated CircuitsSilicon On InsulatorInterconnect (Integrated Circuits)	1985	59
0.5 micron CMOS for high performance at 3.3 V R. A. Chapman, C.C. Wei, David A. Bell, EngineeringVlsi DesignComputer ArchitectureIntegrated CircuitsDesign Length	2003	47
Titanium nitride local interconnect technology for VLSI T.E. Tang, C.C. Wei, R.A. Haken, IEEE Transactions on Electron Devices EngineeringVlsi DesignIntegrated CircuitsSilicon On InsulatorInterconnect (Integrated Circuits)	1987	44
An 0.8&amp;#181;m CMOS technology for high performance logic applications R. A. Chapman, R.A. Haken, David A. Bell, Electrical EngineeringEngineeringVlsi DesignHigh-speed ElectronicsDevice Integration	1987	36
Analysis of the deep depletion MOSFET and the use of the d.c. characteristics for determining bulk-channel charge-coupled device parameters R.A. Haken Solid-State Electronics Device ModelingElectrical EngineeringEngineeringElectronic EngineeringBias Temperature Instability	1978	33

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