Concepedia

Karen A. Graziano

KA

3

Publications

72

Citations

3

H-Index

1988

Active since

Affiliations

Hewlett-Packard (United States)(Current)

Karen A. Graziano is an author at Hewlett-Packard (United States) specializing in materials science, engineering, and applied physics.

Top concepts

Material ScienceEngineeringPhotochemistryApplied PhysicsOptoelectronicsOptical PropertiesPhysicsChemistryPhotonicsSpectroscopy

Publications per year

1988–1990

3

Publications

3

Deep UV ANR Photoresists For 248 nm Excimer Laser Photolithography

James W. Thackeray, George W. Orsula, Edward K. Pavelchek et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1989 · 28 citations

Materials Science, Photonics, Advanced Negative Resist +14

Acid hardening positive photoresist using photochemical generation of base.

Mark R. Winkle, Karen A. Graziano · Journal of Photopolymer Science and Technology · 1990 · 27 citations · Full text

Materials Science, Photochemical Generation, Photochemistry +1

High Resolution, Novolak Based Negative Tone Electron Beam Resist

Mark P. deGrandpre, Karen A. Graziano, Stephen D. Thompson et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1988 · 17 citations

High Resolution, Engineering, Electron-beam Lithography +21

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