Edward K. Pavelchek

Channel‐Constrained Electroless Metal Deposition on Ligating Self‐Assembled Film Surfaces

Mu‐San Chen, Susan L. Brandow, Charles S. Dulcey et al. · Journal of The Electrochemical Society · 1999 · 53 citations

Engineering, Optoelectronic Devices, Integrated Circuits +20

Deep UV ANR Photoresists For 248 nm Excimer Laser Photolithography

James W. Thackeray, George W. Orsula, Edward K. Pavelchek et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1989 · 28 citations

Materials Science, Photonics, Advanced Negative Resist +14

<title>Dissolution inhibition mechanism of ANR photoresists: crosslinking vs. -OH site consumption</title>

James W. Thackeray, George W. Orsula, Martha M. Rajaratnam et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1991 · 22 citations

-Oh Site Consumption, Melamine Loading, Engineering +19

Improved notch model for resist dissolution in lithography simulation

Stewart A. Robertson, Edward K. Pavelchek, W Hoppe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 14 citations

Dissolution Rate Equations, Engineering, Notch Model +14

Silylated acid hardened resist process: A deep ultraviolet surface imaging technique

Edward K. Pavelchek, John F. Bohland, James W. Thackeray et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 10 citations

Short Wavelength Optic, Optical Materials, Engineering +21