Concepedia

George W. Orsula

GW

4

Publications

70

Citations

4

H-Index

1989

Active since

Affiliations

Shipley Hospital(Current)

George W. Orsula is an author at Shipley Hospital specializing in engineering, applied physics, and chemistry.

Top concepts

EngineeringChemistryApplied PhysicsMaterial SciencePhotochemistryPolymer ScienceMicrofabricationOptical MaterialsPolymer ChemistryOptical Properties

Publications per year

1989–1994

4

Publications

4

Deep UV ANR Photoresists For 248 nm Excimer Laser Photolithography

James W. Thackeray, George W. Orsula, Edward K. Pavelchek et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1989 · 28 citations

Materials Science, Photonics, Advanced Negative Resist +14

<title>Dissolution inhibition mechanism of ANR photoresists: crosslinking vs. -OH site consumption</title>

James W. Thackeray, George W. Orsula, Martha M. Rajaratnam et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1991 · 22 citations

-Oh Site Consumption, Melamine Loading, Engineering +19

Silylated acid hardened resist process: A deep ultraviolet surface imaging technique

Edward K. Pavelchek, John F. Bohland, James W. Thackeray et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 10 citations

Short Wavelength Optic, Optical Materials, Engineering +21

The Development of Chemically Amplified Positive- and Negative-tone Resists for DUV Lithography.

James W. Thackeray, Tim Adams, Michael F. Cronin et al. · Journal of Photopolymer Science and Technology · 1994 · 10 citations · Full text

High Resolution, Engineering, Electron-beam Lithography +24

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