N. Proust

Structure and crystal growth of atmospheric and low-pressure chemical-vapor-deposited silicon films

R. Bisaro, J. Magariño, N. Proust et al. · Journal of Applied Physics · 1986 · 109 citations

Materials Science, Semiconductors, Gas Phase Nucleation +15

High rate etching of 4H–SiC using a SF6/O2 helicon plasma

Pascal Chabert, N. Proust, J. Perrin et al. · Applied Physics Letters · 2000 · 59 citations

Materials Science, Electrical Engineering, Engineering +12

Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma‐Enhanced Chemical Vapor Deposition

F. Plais, B. Agius, F. Abel et al. · Journal of The Electrochemical Society · 1992 · 35 citations

Materials Science, Engineering, Physics +12

Crystallization study of chemically vapour-deposited amorphous silicon films by in situ x-ray diffraction

R. Bisaro, N. Proust, J. Magariño et al. · Thin Solid Films · 1985 · 24 citations

Materials Science, Engineering, Silicon On Insulator +9

Electrical properties of distributed electron cyclotron resonance plasma-deposited SiO2-InP diodes

F. Plais, B. Agius, N. Proust et al. · Applied Physics Letters · 1991 · 22 citations

Engineering, Integrated Circuits, Silicon On Insulator +16