Concepedia

F. Plais

FP

Statistics

Publications

3

Citations

82

H-Index

3

Active since

1991

Affiliations

Instituts Universitaires de Technologie(Current)

Université Paris-Sud

Université Paris Cité

F. Plais is an author at Instituts Universitaires de Technologie specializing in materials science, semiconductor interfaces, and semiconductor materials.

Publications per year

1991–1992

3

Publications

3

Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma‐Enhanced Chemical Vapor Deposition

F. Plais, B. Agius, F. Abel et al. · Journal of The Electrochemical Society · 1992 · 35 citations

, , +14

Device Quality SiO<sub>2</sub> Deposited by Distributed Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition without Substrate Heating

Nan Jiang, M. C. Hugon, B. Agius et al. · Japanese Journal of Applied Physics · 1992 · 25 citations

, , +17

Electrical properties of distributed electron cyclotron resonance plasma-deposited SiO2-InP diodes

F. Plais, B. Agius, N. Proust et al. · Applied Physics Letters · 1991 · 22 citations

, , +14

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