M. C. Hugon

Low temperature deposition of silicon nitride films by distributed electron cyclotron resonance plasma-enhanced chemical vapor deposition

Stephane Sitbon, M. C. Hugon, B. Agius et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1995 · 52 citations

Natural Sciences, Materials Engineering, Materials Science +17

Electrical properties of metal–insulator–semiconductor structures with silicon nitride dielectrics deposited by low temperature plasma enhanced chemical vapor deposition distributed electron cyclotron resonance

M. C. Hugon, Franck Delmotte, B. Agius et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 42 citations

Natural Sciences, Materials Science, Physics +17

Influence of backscattered neutrals on the grain size of magnetron-sputtered TaN thin films

Martin Rudolph, Daniel Lundin, Eddy Foy et al. · Thin Solid Films · 2018 · 42 citations

Natural Sciences, Materials Science, Physics +8

Effects of post-deposition annealing in O2 on the electrical characteristics of LaAlO3 films on Si

L. Miotti, K. P. Bastos, Carlos Driemeier et al. · Applied Physics Letters · 2005 · 41 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Physicochemical properties in tungsten films deposited by radio‐frequency magnetron sputtering

P. Collot, B. Agius, Philippe Estrache et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1988 · 31 citations

Natural Sciences, Materials Engineering, Materials Science +17