Concepedia
Statistics
Publications
5
Citations
172
H-Index
Active since
1978
E. M. Doerries is an author specializing in materials engineering, resist sensitivity, and materials science.
Publications per year
1978–1981
A Sensitive Novolac‐Based Positive Electron Resist
M. J. Bowden, L. F. Thompson, Susan R. Fahrenholtz et al. · Journal of The Electrochemical Society · 1981 · 50 citations
Natural Sciences, Materials Engineering, Materials Science +12
Negative Electron Resists for Direct Device Lithography: II . Poly(Glycidyl Methacrylate‐Co‐3‐Chlorostyrene)—Lithographic Performance
L. F. Thompson, L.D. Yau, E. M. Doerries · Journal of The Electrochemical Society · 1979 · 42 citations
Engineering, Materials Engineering, Materials Science +15
Negative electron resists for direct fabrication of devices
L. F. Thompson, L. E. Stillwagon, E. M. Doerries · Journal of Vacuum Science and Technology · 1978 · 39 citations
Engineering, Materials Engineering, Materials Science +14
Contrast in the electron-beam lithography of substituted aromatic homopolymers and copolymers
E. D. Feit, L. F. Thompson, C. W. Wilkins et al. · Journal of Vacuum Science and Technology · 1979 · 21 citations
Negative Electron Resists for Direct Device Lithography: I . Initial Material Survey
L. F. Thompson, E. M. Doerries · Journal of The Electrochemical Society · 1979 · 20 citations
Natural Sciences, Materials Engineering, Materials Science +15
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