Tae-Ho Cha

Robust ternary metal gate electrodes for dual gate CMOS devices

Dae-Gyu Park, Tae-Ho Cha, Kwan-Yong Lim et al. · 2002 · 64 citations

Low-power Electronics, Materials Science, Electrical Engineering +15

Impact of atomic-layer-deposited TiN on the gate oxide quality of W/TiN/SiO2/Si metal–oxide–semiconductor structures

Dae-Gyu Park, Kwan-Yong Lim, Heung-Jae Cho et al. · Applied Physics Letters · 2002 · 50 citations

Engineering, Semiconductor Device, Poly-si Gate +16

Work function and thermal stability of Ti1−xAlxNy for dual metal gate electrodes

Tae-Ho Cha, Dae-Gyu Park, Tae-Kyun Kim et al. · Applied Physics Letters · 2002 · 38 citations

Engineering, Work Function, Thin Film Process Technology +16

Novel damage-free direct metal gate process using atomic layer deposition

Dae-Gyu Park, Kwan-Yong Lim, Heung-Jae Cho et al. · 2002 · 17 citations

Materials Science, Electrical Engineering, Engineering +14

Characteristics of sputtered Ti1−xAlxN films for storage node electrode barriers

Dae-Gyu Park, Tae-Ho Cha, Sang-Hyeob Lee et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 17 citations

Materials Science, Materials Engineering, Electrical Engineering +13