Roger F. Caldwell

Practical method for full-chip optical proximity correction

J. Fung Chen, Thomas L. Laidig, Kurt E. Wampler et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1997 · 41 citations

Optical Materials, Engineering, Optic Design +17

Optical proximity correction for intermediate-pitch features using sub-resolution scattering bars

J. Fung Chen, Tom Laidig, Kurt E. Wampler et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997 · 21 citations

Engineering, Optic Design, Optical Testing +18

Practical technology path to sub-0.10-μm process generations via enhanced optical lithography

J. Fung Chen, Thomas L. Laidig, Kurt E. Wampler et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 15 citations

Engineering, Electron-beam Lithography, Process Generations +17

Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation I

Robert Socha, John S. Petersen, J. Fung Chen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1998 · 11 citations

Engineering, Electron-beam Lithography, Optic Design +21

Resolution enhancement with high-transmission attenuating phase-shift masks

Robert Socha, Will Conley, Xuelong Shi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 10 citations

High Resolution, Engineering, Electron-beam Lithography +18