I. Costina

Residual Metallic Contamination of Transferred Chemical Vapor Deposited Graphene

Grzegorz Łupina, Julia Kitzmann, I. Costina et al. · ACS Nano · 2015 · 288 citations · Full text

Materials Science, Graphene Nanomeshes, Electrical Engineering +14

Band gap of amorphous and well-ordered Al2O3 on Ni3Al(100)

I. Costina, R. Franchy · Applied Physics Letters · 2001 · 143 citations

Materials Engineering, Materials Science, Engineering +10

Oxygen Vacancy Induced Room Temperature Ferromagnetism in Pr-Doped CeO₂ Thin Films on Silicon

Gang Niu, Erwin Hildebrandt, Markus Andreas Schubert et al. · ACS Applied Materials & Interfaces · 2014 · 100 citations

Material insights of HfO2-based integrated 1-transistor-1-resistor resistive random access memory devices processed by batch atomic layer deposition

Gang Niu, Hee‐Dong Kim, Robin Roelofs et al. · Scientific Reports · 2016 · 50 citations · Full text

On the role of Ti adlayers for resistive switching in HfO2-based metal-insulator-metal structures: Top versus bottom electrode integration

Ch. Walczyk, Christian Wenger, Damian Walczyk et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2011 · 43 citations

Engineering, Ti Top Adlayer, Ti Bottom Adlayer +19