I. Costina

Residual Metallic Contamination of Transferred Chemical Vapor Deposited Graphene

Grzegorz Łupina, Julia Kitzmann, I. Costina et al. · ACS Nano · 2015 · 293 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Band gap of amorphous and well-ordered Al2O3 on Ni3Al(100)

I. Costina, R. Franchy · Applied Physics Letters · 2001 · 149 citations · Full text

Natural Sciences, Materials Science, Physics +17

Oxygen Vacancy Induced Room Temperature Ferromagnetism in Pr-Doped CeO₂ Thin Films on Silicon

Gang Niu, Erwin Hildebrandt, Markus Andreas Schubert et al. · ACS Applied Materials & Interfaces · 2014 · 104 citations

Natural Sciences, Materials Engineering, Materials Science +16

Material insights of HfO2-based integrated 1-transistor-1-resistor resistive random access memory devices processed by batch atomic layer deposition

Gang Niu, Hee‐Dong Kim, Robin Roelofs et al. · Scientific Reports · 2016 · 51 citations · Full text

Engineering, Materials Engineering, Materials Science +17

On the role of Ti adlayers for resistive switching in HfO2-based metal-insulator-metal structures: Top versus bottom electrode integration

Ch. Walczyk, Christian Wenger, Damian Walczyk et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2011 · 44 citations

Engineering, Materials Engineering, Materials Science +17