Juliann Opitz

Diffusion and Distribution Studies of Photoacid Generators. Ion Beam Analysis in Lithograpy.

Narayan Sundararajan, Christopher Keimel, Navin Bhargava et al. · Journal of Photopolymer Science and Technology · 1999 · 23 citations · Full text

Engineering, Microscopy, Diffusion Characteristics +20

Progress in 193 nm Positive Resists.

Robert D. Allen, Ratnam Sooriyakumaran, Juliann Opitz et al. · Journal of Photopolymer Science and Technology · 1996 · 23 citations · Full text

Materials Science, Engineering, Specific Resistance +13

Protecting groups for 193-nm photoresists

Robert D. Allen, Ratnam Sooriyakumaran, Juliann Opitz et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1996 · 20 citations

Materials Science, Photonics, Chemical Engineering +13

Dissolution/swelling behavior of cycloolefin polymers in aqueous base

Hiroshi Itô, Robert D. Allen, Juliann Opitz et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 17 citations

Correlation of UVIIHS resist chemistry to dissolution rate measurements

Jim Thackeray, T. H. Fedynyshyn, Dae Joon Kang et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 14 citations

Dissolution Rate Measurements, Chemical Engineering, Engineering +11