S. V. Jagadeesh Chandra

Author

Also Known As

S Chandra, S V J Chandra, S V Jagadeesh Chandra, S. Chandra, S. V. JAGADEESH CHANDRA, S. V. Jagadeesh Chandra, S.V. Jagadeesh CHANDRA, S.V. Jagadeesh Chandra, Sanskriti Chandra, Shashwati Chandra

Publications

466

Citations

H-Index

Concepts

All Affiliations

Sri Venkateswara University Indian Institute of Science Bangalore Jeonbuk National University Universidade Nova de Lisboa International Institute of Information Technology

About

S. V. Jagadeesh Chandra is an author at Sri Venkateswara University specializing in applied physics, materials science, and engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	12	14	339
2	Applied Physics	12	14	339
3	Electrical Engineering	8	8	150
4	Natural Sciences	2	2	26
5	Chemistry	1	1	12

S. V. Jagadeesh Chandra

Publications

390

Citations

H-Index

Page 1

	Year	Citations
Effect of substrate temperature on the structural, optical and electrical properties of dc magnetron sputtered tantalum oxide films S. V. Jagadeesh Chandra, S. Uthanna, G. Mohan Rao Applied Surface Science Materials ScienceMagnetismOptical MaterialsEngineeringMaterial Analysis	2007	84
Effect of substrate bias voltage on the structure, electric and dielectric properties of TiO2 thin films by DC magnetron sputtering M. Chandra Sekhar, Paturu Kondaiah, S. V. Jagadeesh Chandra, Applied Surface Science Materials EngineeringMaterials ScienceElectrical EngineeringEngineeringNanoelectronics	2011	47
Studies on e-beam deposited transparent conductive films of In<sub>2</sub>O<sub>3</sub>:Sn at moderate substrate temperatures S.A. Agnihotry, Komal Saini, Tanuj Saxena, Journal of Physics D Applied Physics Materials ScienceMaterials EngineeringTransparent Conductive FilmsEngineeringPreferred Orientation	1985	38
Structural and electrical properties of radio frequency magnetron sputtered tantalum oxide films: Influence of post-deposition annealing S. V. Jagadeesh Chandra, Chel‐Jong Choi, S. Uthanna, Materials Science in Semiconductor Processing Materials ScienceMagnetismMaterials EngineeringPost-deposition AnnealingEngineering	2010	25
Substrate temperature influenced physical properties of silicon MOS devices with TiO <sub>2</sub> gate dielectric M. Chandra Sekhar, Paturu Kondaiah, S. V. Jagadeesh Chandra, Surface and Interface Analysis	2012	22
Post-deposition annealing influenced structural and electrical properties of Al/TiO2/Si gate capacitors M. Chandra Sekhar, Paturu Kondaiah, G. Mohan Rao, Superlattices and Microstructures Materials ScienceMaterials EngineeringElectrical EngineeringPost-deposition AnnealingEngineering	2013	21
Substrate temperature influenced ZrO <sub>2</sub> films for MOS devices P. Kondaiah, S. V. Jagadeesh Chandra, Elvira Fortunato, Surface and Interface Analysis	2020	19
Heat treatment induced structural and optical properties of rf magnetron sputtered tantalum oxide films S. V. Jagadeesh Chandra, G. Mohan Rao, S. Uthanna Crystal Research and Technology Magnetic PropertiesOptical MaterialsEngineeringThin Film Process TechnologyMagnetism	2007	16
Modulations in effective work function of platinum gate electrode in metal-oxide-semiconductor devices S. V. Jagadeesh Chandra, Elvira Fortunato, Rodrigo Martins, Thin Solid Films Materials ScienceElectrical EngineeringEngineeringSurface ElectrochemistryOxide Electronics	2011	15
Substrate bias voltage influenced structural, electrical and optical properties of dc magnetron sputtered Ta2O5 films S. V. Jagadeesh Chandra, M. Chandrasekhar, G. Mohan Rao, Journal of Materials Science Materials in Electronics Materials EngineeringMaterials ScienceElectrical EngineeringOptical MaterialsEngineering	2008	15

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