Publication | Closed Access
Post-deposition annealing influenced structural and electrical properties of Al/TiO2/Si gate capacitors
21
Citations
47
References
2013
Year
Materials ScienceMaterials EngineeringElectrical EngineeringPost-deposition AnnealingEngineeringNanoelectronicsOxide ElectronicsApplied PhysicsAl/tio2/si Gate CapacitorsSemiconductor Device FabricationSilicon On InsulatorMicroelectronicsElectrical PropertiesSemiconductor Device
| Year | Citations | |
|---|---|---|
Page 1
Page 1