Jonas C. Gertsch

In Situ Thermal Atomic Layer Etching for Sub-5 nm InGaAs Multigate MOSFETs

Wenjie Lu, Young‐Hee Lee, Jonas C. Gertsch et al. · Nano Letters · 2019 · 40 citations

Hemispherical micro-resonators from atomic layer deposition

Jason M. Gray, J. P. Houlton, Jonas C. Gertsch et al. · Journal of Micromechanics and Microengineering · 2014 · 34 citations

Engineering, Mechanical Engineering, Metamaterials +21

First Transistor Demonstration of Thermal Atomic Layer Etching: InGaAs FinFETs with sub-5 nm Fin-width Featuring in situ ALE-ALD

Wenjie Lu, Young‐Hee Lee, Jessica A. Murdzek et al. · 2018 · 34 citations

Semiconductor Technology, Electrical Engineering, Ingaas Finfets +15

SF₄ as the Fluorination Reactant for Al₂O₃ and VO₂ Thermal Atomic Layer Etching

Jonas C. Gertsch, Austin M. Cano, Victor M. Bright et al. · Chemistry of Materials · 2019 · 27 citations

Aluminium Nitride, Engineering, Surface Nanotechnology +16

Ultrathin thermoacoustic nanobridge loudspeakers from ALD on polyimide

Joseph J. Brown, N.C. Moore, Omkar D. Supekar et al. · Nanotechnology · 2016 · 15 citations