H.F. Luan

Dual-metal gate CMOS technology with ultrathin silicon nitride gate dielectric

Yee-Chia Yeo, Qiang Lu, P. Ranade et al. · IEEE Electron Device Letters · 2001 · 109 citations

Materials Engineering, Gate Dielectric Stack, Electrical Engineering +13

Metal gate work function engineering using AlNx interfacial layers

Husam N. Alshareef, H.F. Luan, Kiho Choi et al. · Applied Physics Letters · 2006 · 52 citations

Materials Engineering, Materials Science, Electrical Engineering +15

All-optical image transportation through a multimode fibre using a miniaturized diffractive neural network on the distal facet

Haoyi Yu, Zihao Huang, Simone Lamon et al. · Nature Photonics · 2025 · 49 citations

All-optical Image Transportation, Photonics, Distal Facet +12

High quality ultra thin CVD HfO/sub 2/ gate stack with poly-Si gate electrode

S.J. Lee, H.F. Luan, Weiping Bai et al. · 2002 · 48 citations

Materials Engineering, Materials Science, Electrical Engineering +13

Performance and reliability of ultra thin CVD HfO/sub 2/ gate dielectrics with dual poly-Si gate electrodes

S.J. Lee, H.F. Luan, C.H. Lee et al. · 2002 · 46 citations

Gate Dielectrics, Electrical Engineering, Gate Stack +11