Anthony R. Forte

Limits to etch resistance for 193-nm single-layer resists

Roderick R. Kunz, S. C. Palmateer, Anthony R. Forte et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1996 · 74 citations

Engineering, Responsive Polymers, 193-Nm Transparent Polymers +23

A High-Power MEMS Electric Induction Motor

Carol Livermore, Anthony R. Forte, T. M. Lyszczarz et al. · Journal of Microelectromechanical Systems · 2004 · 58 citations

Electrical Engineering, Energy Harvesting, Engineering +14

Comparison of metrology methods for quantifying the line edge roughness of patterned features

Christine M. Nelson, S. C. Palmateer, Anthony R. Forte et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 40 citations

Edge Roughness Measurement, Engineering, Measurement +22

The ZEUS vertex detector: design and prototype

C. Alvisi, G. Anzivino, F. Arzarello et al. · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · 1991 · 35 citations

Machine Vision, Image Analysis, Engineering +7

Subwavelength Optical Lithography with Phase-Shift Photomasks

M. Fritze, Brian Tyrrell, David K. Astolfi et al. · 2003 · 20 citations

Engineering, Electron-beam Lithography, Microscopy +19