Tsutomu Shimokawa

Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified Resist for Extreme Ultraviolet Lithography

Ryo Hirose, Takahiro Kozawa, Seiichi Tagawa et al. · Japanese Journal of Applied Physics · 2007 · 108 citations

Optical Materials, Engineering, Electron-beam Lithography +16

Analysis of acid yield generated in chemically amplified electron beam resist

Takahiro Kozawa, Takumi Shigaki, Kazumasa Okamoto et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2006 · 99 citations

Engineering, Electron-beam Lithography, Acid Generation +17

Acid Generation Mechanism of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Post-Optical Lithography: Acid Yield and Deprotonation Behavior of Poly(4-hydroxystyrene) and Poly(4-methoxystyrene)

Atsuro Nakano, Takahiro Kozawa, Kazumasa Okamoto et al. · Japanese Journal of Applied Physics · 2006 · 80 citations

Engineering, Electron-beam Lithography, Chemistry +20

Dependence of Acid Generation Efficiency on Molecular Structures of Acid Generators upon Exposure to Extreme Ultraviolet Radiation

Ryo Hirose, Takahiro Kozawa, Seiichi Tagawa et al. · Applied Physics Express · 2008 · 66 citations

Ultraviolet Light, Short Wavelength Optic, Optical Materials +22

Alicyclic Polymers for 193 nm Resist Applications:  Synthesis and Characterization

Uzodinma Okoroanyanwu, Tsutomu Shimokawa, Jeffrey D. Byers et al. · Chemistry of Materials · 1998 · 58 citations

Engineering, Organic Chemistry, Nm Photoresist Materials +18