Concepedia

H. Schaber

HS

13

Publications

488

Citations

12

H-Index

1983

Active since

Affiliations

Siemens (Germany)(Current)

IMEC

H. Schaber is an author at Siemens (Germany) specializing in applied physics, engineering, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceElectrical EngineeringMicroelectronicsSemiconductorsPhysicsChemistryNanoelectronicsIntegrated Circuits

Publications per year

1983–1991

13

Publications

13

Analysis of polycrystalline silicon diffusion sources by secondary ion mass spectrometry

H. Schaber, R. v. Criegern, I. Weitzel · Journal of Applied Physics · 1985 · 76 citations

Engineering, Chemistry, Silicon On Insulator +17

Limitations of TiSi2 as a source for dopant diffusion

V. Probst, H. Schaber, Pierre‐Emmanuel Lippens et al. · Applied Physics Letters · 1988 · 62 citations

Engineering, Chemistry, Silicon On Insulator +18

WSi2 and CoSi2 as diffusion sources for shallow-junction formation in silicon

V. Probst, H. Schaber, A. Mitwalsky et al. · Journal of Applied Physics · 1991 · 58 citations

Materials Science, Semiconductors, Semiconductor Technology +15

Analysis of Polysilicon Diffusion Sources

V. Probst, Horst Böhm, H. Schaber et al. · Journal of The Electrochemical Society · 1988 · 54 citations

Materials Science, Polysilicon Diffusion Sources, Engineering +10

Metal-dopant-compound formation in TiSi2 and TaSi2: Impact on dopant diffusion and contact resistance

V. Probst, H. Schaber, A. Mitwalsky et al. · Journal of Applied Physics · 1991 · 48 citations

Metal-dopant-compound Formation, Engineering, Chemistry +18

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