Concepedia

I. Weitzel

IW

4

Publications

191

Citations

4

H-Index

1981

Active since

Affiliations

Siemens (Germany)(Current)

I. Weitzel is an author at Siemens (Germany) specializing in applied physics, engineering, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceMedicineChemistryThin FilmsMicrostructureSemiconductorsOptoelectronicsMass Spectrometry

Publications per year

1981–1988

4

Publications

4

Analysis of polycrystalline silicon diffusion sources by secondary ion mass spectrometry

H. Schaber, R. v. Criegern, I. Weitzel · Journal of Applied Physics · 1985 · 76 citations

Engineering, Chemistry, Silicon On Insulator +17

Analysis of Polysilicon Diffusion Sources

V. Probst, Horst Böhm, H. Schaber et al. · Journal of The Electrochemical Society · 1988 · 54 citations

Materials Science, Polysilicon Diffusion Sources, Engineering +10

Low resistance polycrystalline silicon by boron or arsenic implantation and thermal crystallization of amorphously deposited films

Frank Becker, H. Oppolzer, I. Weitzel et al. · Journal of Applied Physics · 1984 · 44 citations

Materials Science, Semiconductors, Arsenic Implantation +14

Preparation of glow discharge amorphous silicon for passivation layers

I. Weitzel, R. Primig, K. Kempter · Thin Solid Films · 1981 · 17 citations

Electrical Engineering, Engineering, Glow Discharge +5

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