Hiroaki Nakarai

First generation laser-produced plasma source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 47 citations

Electrical Engineering, Engineering, High Speed +14

Performance of one hundred watt HVM LPP-EUV source

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 45 citations

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 37 citations

Photonics, Electrical Engineering, Engineering +15

Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography

Junichi Fujimoto, Tamotsu Abe, Satoshi Tanaka et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2012 · 33 citations

Ultraviolet Light, Engineering, Laser-plasma Interaction +17

LPP-EUV light source development for high volume manufacturing lithography

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 31 citations

Optical Materials, Engineering, Electron-beam Lithography +19