Junichi Fujimoto

First generation laser-produced plasma source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 47 citations

Electrical Engineering, Engineering, High Speed +14

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 37 citations

Photonics, Electrical Engineering, Engineering +15

CO2 laser drives extreme ultraviolet nano-lithography — second life of mature laser technology

Kacper Nowak, T. Ohta, Takashi Suganuma et al. · Opto-Electronics Review · 2013 · 37 citations · Full text

Engineering, Laser Science, Laser-plasma Interaction +22

Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography

Junichi Fujimoto, Tamotsu Abe, Satoshi Tanaka et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2012 · 33 citations

Ultraviolet Light, Engineering, Laser-plasma Interaction +17

Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source

Tatsuya Yanagida, Hitoshi Nagano, Y. Wada et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 25 citations

Short Wavelength Optic, Engineering, Sn Particles +15