Darko Trivković

Standard cell design in N7: EUV vs. immersion

Bharani Chava, David del Rio, Yasser Sherazi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 30 citations

Engineering, Electron-beam Lithography, Microscopy +18

Single exposure EUV patterning of BEOL metal layers on the IMEC iN7 platform

Víctor M. Blanco Carballo, Joost Bekaert, Ming Mao et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 23 citations

Foundry N5 Equivalent, Engineering, Vlsi Design +19

Freeform illumination sources: an experimental study of source-mask optimization for 22-nm SRAM cells

Joost Bekaert, Bart Laenens, Staf Verhaegen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 22 citations

Engineering, Vlsi Design, Electron-beam Lithography +21

Impact of a SADP flow on the design and process for N10/N7 metal layers

Werner Gillijns, S. M. Yasser Sherazi, Darko Trivković et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 22 citations

Engineering, Mechanical Engineering, Computer-aided Design +27

Design and pitch scaling for affordable node transition and EUV insertion scenario

Ryoung-Han Kim, Julien Ryckaert, Praveen Raghavan et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 11 citations