Olivier Toublan

Adoption of OPC and the impact on design and layout

F. M. Schellenberg, Olivier Toublan, Luigi Capodieci et al. · 2001 · 31 citations

Engineering, Electron-beam Lithography, Electronic Design Automation +19

Layout compensation for EUV flare

Franklin M. Schellenberg, James Word, Olivier Toublan · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 22 citations

Short Wavelength Optic, Engineering, Aerospace Engineering +9

High accuracy 65nm OPC verification: full process window model vs. critical failure ORC

Amandine Borjon, Jérôme Belledent, Shumay Shang et al. · Optical Microlithography XVIII · 2005 · 13 citations

Engineering, Hardware Verification Language, Optical Testing +24

Full-chip Process Simulation for Silicon DRC

Nicolas B. Cobb, Yuri Granik, Emile Sahouria et al. · TechConnect Briefs · 2000 · 12 citations

Geometric Modeling, Hardware Modeling, Physical Design (Electronics) +13

Improvement of empirical OPC model robustness using full-chip aerial image analysis

Thomas Roessler, Beate Frankowsky, Olivier Toublan · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 12 citations

Light Intensity Distribution, Image Analysis, Engineering +15