Jan Sedláček

Materials issues for optical components and photomasks in 157 nm lithography

Vladimir Liberman, T. M. Bloomstein, M. Rothschild et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 54 citations

Optical Materials, Engineering, Electron-beam Lithography +22

Liquid immersion lithography: Why, how, and when?

M. Rothschild, T. M. Bloomstein, Roderick R. Kunz et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 49 citations

Materials Science, Optical Materials, Engineering +14

157 nm: Deepest deep-ultraviolet yet

M. Rothschild, T. M. Bloomstein, Jane E. Curtin et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 48 citations

Ultraviolet Light, Short Wavelength Optic, Optical Materials +23

Chain-Growth Insertion Polymerization of 1,3-Diethynylbenzene High Internal Phase Emulsions into Reactive π-Conjugated Foams

Eva Slováková, Marjan Ješelnik, Ema Žagar et al. · Macromolecules · 2014 · 45 citations

Solid Phase Hyper-cross-linking, Chain-growth Insertion Polymerization, Reactive π-Conjugated Foams +20

MCM-41 anchored Schrock catalyst Mo( CHCMe2Ph)( N-2,6-i-Pr2C6H3)[OCMe(CF3)2]2-activity in 1-heptene metathesis and cross-metathesis reactions

Hynek Balcar, Naděžda Žilková, Jan Sedláček · Journal of Molecular Catalysis A Chemical · 2005 · 42 citations

Materials Science, Inorganic Chemistry, 1-Heptene Metathesis +10