6
Publications
298
Citations
6
H-Index
1997
Active since
Sriram Anjur is an author at Cabot Microelectronics (United States) specializing in materials science, engineering, and mechanical engineering.
Top concepts
EngineeringMaterial ScienceMechanical EngineeringMicroscopyApplied PhysicsSurface ScienceMicrofabricationElectronic PackagingMicroelectronicsSurface Polishing
Publications per year
1997–2010
6
6
Wear phenomena in chemical mechanical polishing
Hong Liang, F. B. Kaufman, Rubén Sevilla et al. · Wear · 1997 · 107 citations
Measurements of Slurry Film Thickness and Wafer Drag during CMP
Jeffrey Lu, Chris Rogers, Vincent P. Manno et al. · Journal of The Electrochemical Society · 2004 · 53 citations
Engineering, Microscopy, Wafer Drag +20
Ting Sun, Len Borucki, Yun Zhuang et al. · Japanese Journal of Applied Physics · 2010 · 31 citations
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