Vladimir Volynets

Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor

Dougyong Sung, Sangmin Jeong, Young-Min Park et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2008 · 39 citations

Engineering, Plasma-emission Intensity, Plasma Physics +18

Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. I. Plasma source and critical fluxes

Vladimir Volynets, Yuri Barsukov, Gonjun Kim et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2020 · 39 citations · Full text

Quantum Chemistry Simulations, Engineering, Vacuum Device +18

Insights to scaling remote plasma sources sustained in NF3 mixtures

Shuo Huang, Vladimir Volynets, James R. Hamilton et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2017 · 36 citations · Full text

Nf3 Mixtures, Engineering, Physics +15

Experimental study of plasma non-uniformities and the effect of phase-shift control in a very high frequency capacitive discharge

Vladimir Volynets, Han-Soo Shin, Dongwoo Kang et al. · Journal of Physics D Applied Physics · 2010 · 32 citations

Electrical Engineering, Plasma Uniformity, Engineering +12

Experimental and theoretical study of the CF₄DC glow discharge positive column

Vladimir Volynets, A. V. Lukyanova, A. T. Rakhimov et al. · Journal of Physics D Applied Physics · 1993 · 32 citations

Discharge Positive Column, Electrical Engineering, Reduced Electric Field +9