Concepedia

Gonjun Kim

GK

Statistics

Publications

3

Citations

96

H-Index

3

Active since

2017

Affiliations

Samsung (South Korea)(Current)

University of Michigan

Gonjun Kim is an author at Samsung (South Korea) specializing in materials engineering, etching processes, and etch mechanisms.

Publications per year

2017–2020

3

Publications

3

Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. I. Plasma source and critical fluxes

Vladimir Volynets, Yuri Barsukov, Gonjun Kim et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2020 · 44 citations · Full text

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Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. II. Surface reaction mechanism

Ji-Eun Jung, Yuri Barsukov, Vladimir Volynets et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2020 · 29 citations · Full text

, , +17

Role of NO in highly selective SiN/SiO2 and SiN/Si etching with NF3/O2 remote plasma: Experiment and simulation

Yuri Barsukov, Vladimir Volynets, Sangjun Lee et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2017 · 23 citations

, , +16

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