L. F. Edge

Measurement of the band offsets between amorphous LaAlO3 and silicon

L. F. Edge, Darrell G. Schlom, Scott A. Chambers et al. · Applied Physics Letters · 2004 · 160 citations · Full text

Natural Sciences, Materials Science, Physics +17

Low-frequency charge noise in Si/SiGe quantum dots

Elliot J. Connors, JJ Nelson, Haifeng Qiao et al. · Physical review. B./Physical review. B · 2019 · 151 citations · Full text

Engineering, Materials Science, Physics +17

Charge-noise spectroscopy of Si/SiGe quantum dots via dynamically-decoupled exchange oscillations

Elliot J. Connors, JJ Nelson, L. F. Edge et al. · Nature Communications · 2022 · 120 citations · Full text

Natural Sciences, Electrical Engineering, Physics +15

Extremely thin SOI (ETSOI) CMOS with record low variability for low power system-on-chip applications

Kangguo Cheng, A. Khakifirooz, P. Kulkarni et al. · 2009 · 104 citations

Engineering, Computer Engineering, Electrical Engineering +17

Measurement of oxygen diffusion in nanometer scale HfO2 gate dielectric films

Sufi Zafar, Hemanth Jagannathan, L. F. Edge et al. · Applied Physics Letters · 2011 · 97 citations

Natural Sciences, Materials Engineering, Materials Science +17