Josef Mathuni

Dry etch improvements in the SOI wafer flow process for IPL stencil mask fabrication

Florian Letzkus, Joerg Butschke, B. Höfflinger et al. · Microelectronic Engineering · 2000 · 35 citations

Engineering, Manufacturing Engineering, Materials Engineering +16

SOI wafer flow process for stencil mask fabrication

Joerg Butschke, Albrecht Ehrmann, B. Höfflinger et al. · Microelectronic Engineering · 1999 · 26 citations

Engineering, Manufacturing Engineering, Materials Engineering +14

Investigations of SU-8 removal from metallic high aspect ratio microstructures with a novel plasma technique

Rainer Engelke, Josef Mathuni, Gisela Ahrens et al. · Microsystem Technologies · 2008 · 22 citations

Engineering, Materials Engineering, Materials Science +16

PN and SOI wafer flow process for stencil mask fabrication

Joerg Butschke, Albrecht Ehrmann, E. Haugeneder et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 13 citations

Engineering, Materials Engineering, Materials Science +14

Optimizing edge topography of alternating phase-shift masks using rigorous mask modeling

Christoph M. Friedrich, Leonhard Mader, Andreas Erdmann et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 12 citations

Engineering, Materials Engineering, Digital Fabrication +13