Laura L. Tedder

Mechanistic studies of dielectric thin film growth by low pressure chemical vapor deposition: The reaction of tetraethoxysilane with SiO2 surfaces

Laura L. Tedder, Guangquan Lu, John E. Crowell · Journal of Applied Physics · 1991 · 66 citations

Mechanistic Studies, Engineering, Chemistry +18

Model studies of dielectric thin film growth: Chemical vapor deposition of SiO2

John E. Crowell, Laura L. Tedder, Hee-Chuen Cho et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1990 · 54 citations

Engineering, Reactive Adsorption, Chemistry +19

The chemical vapor deposition of SiO2 from tetraethoxysilane: The effect of the surface hydroxyl concentration

Laura L. Tedder, John E. Crowell, M. A. Logan · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1991 · 37 citations

Engineering, Surface Hydroxyl Concentration, Dissociative Adsorption +16

Real-time process and product diagnostics in rapid thermal chemical vapor deposition using <i>in situ</i> mass spectrometric sampling

Laura L. Tedder, Gary W. Rubloff, Iqbal Shareef et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1995 · 33 citations

Engineering, Chemical Analysis, Biological Mass Spectrometry +19

Initial Stages of Fe Chemical Vapor Deposition onto Si(100)

D. P. Adams, Laura L. Tedder, T. M. Mayer et al. · Physical Review Letters · 1995 · 29 citations

Engineering, Chemistry, Chemical Deposition +17