J. Jolly

Surface reaction probabilities and kinetics of H, SiH3, Si2H5, CH3, and C2H5 during deposition of a-Si:H and a-C:H from H2, SiH4, and CH4 discharges

J. Perrin, Masaharu Shiratani, Patrick Kae-Nune et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 230 citations

Engineering, Surface Reaction Probabilities, Chemistry +19

Ion flux nonuniformities in large-area high-frequency capacitive discharges

A. Perret, Pascal Chabert, Jean‐Paul Booth et al. · Applied Physics Letters · 2003 · 147 citations

Engineering, Glow Discharge, Plasma Science +18

Laser-induced resonance fluorescence as a diagnostic technique in non-thermal equilibrium plasmas

J. Amorim, G. Baravian, J. Jolly · Journal of Physics D Applied Physics · 2000 · 136 citations

Engineering, Laser-plasma Interaction, Absorption Spectroscopy +20

Mass spectrometry detection of radicals in SiH₄-CH₄-H₂glow discharge plasmas

Patrick Kae-Nune, J. Perrin, Jean Guillon et al. · Plasma Sources Science and Technology · 1995 · 104 citations

Radical Emission, Engineering, Mass Spectrometry Detection +17

Ion energy uniformity in high-frequency capacitive discharges

A. Perret, Pascal Chabert, J. Jolly et al. · Applied Physics Letters · 2004 · 103 citations

Standing Wave Effect, Electrical Engineering, Plasma Electronics +13