P. M. Rousseau

Arsenic deactivation enhanced diffusion: A time, temperature, and concentration study

P. M. Rousseau, Peter B. Griffin, Wicia M. Fang et al. · Journal of Applied Physics · 1998 · 95 citations

Engineering, Laser Applications, Chemistry +23

Vacancy generation resulting from electrical deactivation of arsenic

D. W. Lawther, U. Myler, P. J. Simpson et al. · Applied Physics Letters · 1995 · 77 citations

Semiconductors, Doped Silicon, Electrical Engineering +14

Electrical deactivation of arsenic as a source of point defects

P. M. Rousseau, Peter B. Griffin, J.D. Plummer · Applied Physics Letters · 1994 · 60 citations

Materials Science, Electrical Engineering, Boron Diffusion +15

The effect of source/drain processing on the reverse short channel effect of deep sub-micron bulk and SOI NMOSFETs

S. Crowder, P. M. Rousseau, John P. Snyder et al. · 2002 · 37 citations

Materials Engineering, Electrical Engineering, Semiconductor Device +15

Deactivation in heavily arsenic-doped silicon

M. A. Berding, A. Sher, Mark van Schilfgaarde et al. · Applied Physics Letters · 1998 · 33 citations

Arsenic-doped Silicon, Engineering, Physics +13