Y. Arnal

Microwave multipolar plasmas excited by distributed electron cyclotron resonance: Concept and performance

M. Pichot, A. Durandet, Jacques Pelletier et al. · Review of Scientific Instruments · 1988 · 131 citations

Engineering, Physics, Applied Plasma Physic +10

The etching of polymers in oxygen-based plasmas: A parametric study

O. Joubert, Jacques Pelletier, Y. Arnal · Journal of Applied Physics · 1989 · 92 citations

Oxygen-based Plasmas, Engineering, Electron-beam Lithography +17

Multi-dipolar plasmas for uniform processing: physics, design and performance

A. Lacoste, T. Lagarde, Shih‐I Chu et al. · Plasma Sources Science and Technology · 2002 · 89 citations

Electrical Engineering, Engineering, Physics +12

Determination of the EEDF by Langmuir probe diagnostics in a plasma excited at ECR above a multipolar magnetic field

T. Lagarde, Y. Arnal, A. Lacoste et al. · Plasma Sources Science and Technology · 2001 · 45 citations

Langmuir Probe Diagnostics, Magnetism, Multipolar Magnetic Field +15

Influence of the multipolar magnetic field configuration on the density of distributed electron cyclotron resonance plasmas

T. Lagarde, Jacques Pelletier, Y. Arnal · Plasma Sources Science and Technology · 1997 · 40 citations

Magnetism, Spintronics, Engineering +14