T. Lagarde

Multi-dipolar plasmas for uniform processing: physics, design and performance

A. Lacoste, T. Lagarde, Shih‐I Chu et al. · Plasma Sources Science and Technology · 2002 · 89 citations

Electrical Engineering, Engineering, Physics +12

Determination of the EEDF by Langmuir probe diagnostics in a plasma excited at ECR above a multipolar magnetic field

T. Lagarde, Y. Arnal, A. Lacoste et al. · Plasma Sources Science and Technology · 2001 · 45 citations

Langmuir Probe Diagnostics, Magnetism, Multipolar Magnetic Field +15

Influence of the multipolar magnetic field configuration on the density of distributed electron cyclotron resonance plasmas

T. Lagarde, Jacques Pelletier, Y. Arnal · Plasma Sources Science and Technology · 1997 · 40 citations

Magnetism, Spintronics, Engineering +14

New trends in DECR plasma technology: applications to novel duplex treatments and process combinations with extreme plasma specifications

Jacques Pelletier, A. Lacoste, Y. Arnal et al. · Surface and Coatings Technology · 2001 · 26 citations

Duplex Treatments, Extreme Plasma Specifications, Plasma Science +3

Chemical vapor deposition in high-density low-pressure plasmas: reactor scale-up and performance

Jacques Pelletier, T. Lagarde · Thin Solid Films · 1994 · 26 citations

Materials Science, Chemical Engineering, Engineering +7