K.J. Dickerson

Stress-induced voiding under vias connected to wide Cu metal leads

E.T. Ogawa, J. W. McPherson, J. Rosal et al. · 2003 · 150 citations

Natural Sciences, Materials Engineering, Materials Science +15

The polarity, field and fluence dependence of interface trap generation in thin silicon oxide

D.J. Dumin, J.R. Cooper, K.J. Dickerson et al. · Solid-State Electronics · 1992 · 28 citations

Engineering, Materials Engineering, Materials Science +16

Extrapolation of high-voltage stress measurements to low-voltage operation for thin silicon-oxide films

D.J. Dumin, K.J. Dickerson, George Brown · IEEE Transactions on Reliability · 1991 · 24 citations

Engineering, Electrical Engineering, Materials Science +17

Polarity Dependence of Thin Oxide Wearout

D.J. Dumin, K.J. Dickerson, M. Hall et al. · Reliability physics · 1989 · 20 citations

Engineering, Materials Engineering, Materials Science +17

Characterizing wearout, breakdown, and trap generation in thin silicon oxide

D.J. Dumin, Jay R. Maddux, R. Subramoniam et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1995 · 16 citations

Engineering, Electrical Engineering, Materials Science +17