C. Pomot - Concepedia

Author

C. Pomot

Centre National de la Recherche Scientifique

Also Known As

C Pomot, C. POMOT, C. Pomot, Claude Pomot

Publications

431

Citations

H-Index

Concepts

All Affiliations

Centre National de la Recherche Scientifique Laboratoire de Physique des Plasmas

About

C. Pomot is an author at Centre National de la Recherche Scientifique specializing in engineering, physics, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	12	366
2	Applied Physics	8	8	260
3	Chemistry	3	3	95
4	Chemical Engineering	2	2	39
5	Natural Sciences	1	1	17

C. Pomot

Publications

366

Citations

H-Index

Page 1

	Year	Citations
Application of wide-gap semiconductors to surface ionization: Work functions of AlN and SiC single crystals J.M. Pelletier, Dr Roxane Gervais, C. Pomot Journal of Applied Physics Aluminium NitrideEngineeringWork FunctionSemiconductor DeviceSemiconductors	1984	79
Work function of sintered lanthanum hexaboride J.M. Pelletier, C. Pomot Applied Physics Letters Materials ScienceMaterials EngineeringRichardson ConstantSinteringEngineering	1979	56
Plasma etching in magnetic multipole microwave discharge Y. Arnal, Jacques Pelletier, C. Pomot, Applied Physics Letters Electrical EngineeringPlasma ElectronicsEngineeringReactive PlasmasPhysics	1984	39
Anisotropic etching of silicon using an SF6/Ar microwave multipolar plasma C. Pomot, B. Mahi, Barbara Petit, Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena Materials ScienceElectrical EngineeringSf6 Partial PressureEngineeringPhysics	1986	35
Distributed electron cyclotron resonance in silicon processing: Epitaxy and etching Rudolf R. Burke, Jean Pelletier, C. Pomot, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringElectron-beam LithographyPlasma PhysicsElectron Cyclotron ResonanceSilicon On Insulator	1990	30
The etching of silicon in diluted SF6 plasmas: Correlation between the flux of incident species and the etching kinetics B. Mahi, Y. Arnal, C. Pomot Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena Fluorine Atom GenerationEngineeringPlasma PhysicsDiluted Sf6 PlasmasIncident Fluorine Atom	1987	30
Microwave multipolar plasmas: a possible solution for etching in microelectronics? Jacques Pelletier, Y. Arnal, Barbara Petit, Journal of Physics D Applied Physics Hot-cathode-generated PlasmasEngineeringPlasma ProcessingPlasma ElectronicsMagnetohydrodynamics	1986	22
Surface ionization negative ion source I. Rachidi, J. Monte, J.M. Pelletier, Applied Physics Letters Solid-state IonicInorganic ChemistryChemical EngineeringIodine IonsEngineering	1976	22
Negative surface ionization: Intense halogen-ion source J.M. Pelletier, C. Pomot, J. Cocagne Journal of Applied Physics EngineeringChemistrySurface Negative-ionization SourceIon ProcessChemical Engineering	1979	17
Microwave multipolar plasma for etching and deposition Rudolf R. Burke, C. Pomot Applied Surface Science Electrical EngineeringEngineeringMicrofabricationApplied PhysicsComputational Electromagnetics	1989	13

Page 1