E. C. Douglas - Concepedia

Author

E. C. Douglas

RCA (United States)

Also Known As

E. C. Douglas, E.C. Douglas

Publications

441

Citations

H-Index

Concepts

All Affiliations

RCA (United States)Drexel University BioElectronics (United States)Princeton University

About

E. C. Douglas is an author at RCA (United States) specializing in engineering, applied physics, and microelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	9	9	404
2	Applied Physics	8	8	351
3	Materials Science	6	6	232
4	Electrical Engineering	5	5	207
5	Materials Engineering	2	2	126

E. C. Douglas

Publications

404

Citations

H-Index

Page 1

	Year	Citations
Limitations of the CV technique for ion-implanted profiles Chih-Wei Wu, E. C. Douglas, C.W. Mueller IEEE Transactions on Electron Devices Materials EngineeringIon-implanted Impurity DistributionsElectrical EngineeringIon ImplantationEngineering	1975	66
Transmission electron microscopy studies of brown and golden titanium nitride thin films as diffusion barriers in very large scale integrated circuits N. Kumar, J. T. McGinn, Kambiz Pourrezaei, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceSemiconductorsEngineeringGolden TitaniumSurface Science	1988	65
Growth and properties of TiN and TiOxNy diffusion barriers in silicon on sapphire integrated circuits N. Kumar, M. Fissel, Kambiz Pourrezaei, Thin Solid Films Materials EngineeringEngineeringPhysicsNanoelectronicsApplied Physics	1987	60
A study of the factors which control the efficiency of ion-implanted silicon solar cells E. C. Douglas, R.V. D'Aiello IEEE Transactions on Electron Devices Materials ScienceElectrical EngineeringIon-implantation ParametersEngineeringImplant Parameters	1980	53
Ion implantation for threshold control in COSMOS circuits E. C. Douglas, A.G.F. Dingwall IEEE Transactions on Electron Devices SemiconductorsSemiconductor TechnologyElectrical EngineeringIon ImplantationEngineering	1974	46
Failure mechanisms of TiN thin film diffusion barriers N. Kumar, Kambiz Pourrezaei, Boon Y. Lee, Thin Solid Films Materials ScienceEngineeringDiffusion ResistanceSurface ScienceApplied Physics	1988	44
Techniques for Lapping and Staining Ion‐Implanted Layers Chih-Wei Wu, E. C. Douglas, C.W. Mueller, Journal of The Electrochemical Society Materials ScienceSemiconductorsElectrical EngineeringStaining Ion‐implanted LayersEngineering	1979	32
Growth and properties of radio frequency reactively sputtered titanium nitride thin films N. Kumar, Kambiz Pourrezaei, M. Fissel, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceMaterial AnalysisEngineeringRadio FrequencyPolycrystalline Thin Films	1987	28
Redistribution of ion-implanted impurities in silicon during diffusion in oxidizing ambients Chih-Wei Wu, E. C. Douglas, C.W. Mueller IEEE Transactions on Electron Devices Materials ScienceElectrical EngineeringIon ImplantationBoron ProfilesEngineering	1976	10

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