E. C. Douglas

Limitations of the CV technique for ion-implanted profiles

Chih-Wei Wu, E. C. Douglas, C.W. Mueller · IEEE Transactions on Electron Devices · 1975 · 66 citations

Materials Engineering, Ion-implanted Impurity Distributions, Electrical Engineering +11

Transmission electron microscopy studies of brown and golden titanium nitride thin films as diffusion barriers in very large scale integrated circuits

N. Kumar, J. T. McGinn, Kambiz Pourrezaei et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1988 · 65 citations

Materials Science, Semiconductors, Engineering +14

Growth and properties of TiN and TiOxNy diffusion barriers in silicon on sapphire integrated circuits

N. Kumar, M. Fissel, Kambiz Pourrezaei et al. · Thin Solid Films · 1987 · 60 citations

Materials Engineering, Engineering, Physics +9

A study of the factors which control the efficiency of ion-implanted silicon solar cells

E. C. Douglas, R.V. D'Aiello · IEEE Transactions on Electron Devices · 1980 · 53 citations

Materials Science, Electrical Engineering, Ion-implantation Parameters +13

Ion implantation for threshold control in COSMOS circuits

E. C. Douglas, A.G.F. Dingwall · IEEE Transactions on Electron Devices · 1974 · 46 citations

Semiconductors, Semiconductor Technology, Electrical Engineering +11