R. Verbeeck

Electrical transport in (100)CoSi2/Si contacts

A. Lauwers, K. Kyllesbech Larsen, M. Van Hove et al. · Journal of Applied Physics · 1995 · 28 citations

Materials Engineering, Materials Science, Electrical Engineering +14

A low-cost 90nm RF-CMOS platform for record RF circuit performance

Wutthinan Jeamsaksiri, D. Linten, S. Thijs et al. · 2005 · 22 citations

Low-power Electronics, Electrical Engineering, Ghz Rf Cmos +12

CMOS integration of dual work function phase controlled Ni FUSI with simultaneous silicidation of NMOS (NiSi) and PMOS (Ni-rich silicide) gates on HfSiON

A. Lauwers, A. Veloso, Thomas Hoffmann et al. · 2006 · 17 citations

Materials Science, Electrical Engineering, Novel Integration Scheme +14

Electrochemical Research on the Corrosion of Orthodontic Nickel-Titanium Wires

R. Vandenkerckhove, E. Temmerman, R. Verbeeck · Materials science forum · 1998 · 15 citations

Materials Science, Materials Engineering, Electrical Engineering +13

New CoSi/sub 2/ SALICIDE technology for 0.1 μm processes and below

Q.F. Wang, Karen Maex, Stefan Kubicek et al. · 2002 · 11 citations

Chemical Kinetics, Engineering, Chemistry +16