K. V. Rudenko

To the Issue of the Memristor’s HRS and LRS States Degradation and Data Retention Time

K. V. Rudenko · Russian Microelectronics · 2021 · 64 citations · Full text

Engineering, Emerging Memory Technology, Memory +18

Cryogenic etching of porous low-k dielectrics in CF3Br and CF4 plasmas

Askar Rezvanov, Andrey Miakonkikh, Alexey S. Vishnevskiy et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2017 · 26 citations

Engineering, Chemistry, Plasma Processing +17

Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition

Yu. M. Chesnokov, Andrey Miakonkikh, A. E. Rogozhin et al. · Journal of Materials Science · 2018 · 22 citations

Materials Science, Electrical Engineering, Epitaxial Growth +10

Effect of terminal methyl group concentration on critical properties and plasma resistance of organosilicate low-k dielectrics

Askar Rezvanov, Andrey Miakonkikh, Alexey S. Vishnevskiy et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2020 · 21 citations

Fluorine Radicals, Engineering, Nanoporous Material +18

Plasma etching of poly-Si/SiO2/Si structures: Langmuir-probe and optical-emission-spectroscopy monitoring

K. V. Rudenko, A. V. Myakon’kikh, A. A. Orlikovsky · Russian Microelectronics · 2007 · 18 citations