Statistics
Publications
4
Citations
101
H-Index
4
Active since
1997
Affiliations
Texas Instruments (United States)(Current)
W.W. Dostalik is an author at Texas Instruments (United States) specializing in semiconductor devices, electrical engineering, and materials science.
Publications per year
1997–2002
4
4
Surface nitridation of silicon dioxide with a high density nitrogen plasma
R. Kraft, Thomas Schneider, W.W. Dostalik et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997 · 45 citations
Natural Sciences, Electrical Engineering, Materials Science +16
Inductively coupled plasma (ICP) metal etch damage to 35-60 A gate oxide
S. Krishnan, W.W. Dostalik, K. Brennan et al. · 2002 · 28 citations
Langmuir probe studies of a helicon plasma system
Th. Schneider, W.W. Dostalik, A D Springfield et al. · Plasma Sources Science and Technology · 1999 · 16 citations
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