W.W. Dostalik

Surface nitridation of silicon dioxide with a high density nitrogen plasma

R. Kraft, Thomas Schneider, W.W. Dostalik et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997 · 45 citations

Langmuir Probe, Electrical Engineering, Plasma Electronics +15

Inductively coupled plasma (ICP) metal etch damage to 35-60 A gate oxide

S. Krishnan, W.W. Dostalik, K. Brennan et al. · 2002 · 28 citations

Engineering, Icp Metal Etch, Semiconductor Device +17

Langmuir probe studies of a helicon plasma system

Th. Schneider, W.W. Dostalik, A D Springfield et al. · Plasma Sources Science and Technology · 1999 · 16 citations

Langmuir Probe Studies, Electron Density, Electrical Engineering +12

Trench etch processes for dual damascene patterning of low-k dielectrics

Ping Jiang, F. G. Celii, W.W. Dostalik et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 12 citations

Materials Science, Materials Engineering, Electrical Engineering +13