Thomas Schneider

Surface nitridation of silicon dioxide with a high density nitrogen plasma

R. Kraft, Thomas Schneider, W.W. Dostalik et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997 · 45 citations

Langmuir Probe, Electrical Engineering, Plasma Electronics +15

Characterization of a slot antenna microwave plasma source for hydrogen plasma cleaning

D. Korzec, Florian Werner, A. Brockhaus et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1995 · 40 citations

Engineering, Plasma Science, Plasma Physics +17

Morphology of Si(100) surfaces exposed to a remote H plasma

Jeffrey S. Montgomery, Thomas Schneider, R. J. Carter et al. · Applied Physics Letters · 1995 · 22 citations

Electrical Engineering, Plasma Electronics, Engineering +12

In Situ Remote H‐Plasma Cleaning of Patterned Si ‐ SiO2 Surfaces

R. J. Carter, Thomas Schneider, Jeffrey S. Montgomery et al. · Journal of The Electrochemical Society · 1994 · 21 citations

Materials Science, Surface Characterization, Afm Measurements +10

Surface electronic states of low-temperature H-plasma cleaned Si(100)

Jaewon Cho, Thomas Schneider, J. VanderWeide et al. · Applied Physics Letters · 1991 · 19 citations

Surface Characterization, H Passivation, Engineering +13