Concepedia

Fikadu Alema

FA

33

Publications

1.8K

Citations

22

H-Index

2013

Active since

Affiliations

Agnitron Technology (United States)(Current)

University of California, Santa Barbara

University of Central Florida

University of Utah

University of Wisconsin–Madison

Fikadu Alema is an author at Agnitron Technology (United States) specializing in engineering, applied physics, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceThin FilmsMaterials EngineeringElectrical EngineeringSurface ScienceElectronic DevicesOptoelectronic DevicesSemiconductors

Publications per year

2013–2024

33

Publications

33

MOCVD grown epitaxial β-Ga2O3 thin film with an electron mobility of 176 cm2/V s at room temperature

Yuewei Zhang, Fikadu Alema, Akhil Mauze et al. · APL Materials · 2018 · 251 citations · Full text

Wide-bandgap Semiconductor, Engineering, Electron Mobility +18

Fast growth rate of epitaxial β–Ga2O3 by close coupled showerhead MOCVD

Fikadu Alema, B. Hertog, A. Osinsky et al. · Journal of Crystal Growth · 2017 · 144 citations

Materials Science, Materials Engineering, Engineering +9

MOCVD growth of high purity Ga2O3 epitaxial films using trimethylgallium precursor

G. A. Seryogin, Fikadu Alema, Nicholas Valente et al. · Applied Physics Letters · 2020 · 136 citations

Materials Engineering, Materials Science, Oxide Heterostructures +15

Low 114 cm−3 free carrier concentration in epitaxial β-Ga2O3 grown by MOCVD

Fikadu Alema, Yuewei Zhang, A. Osinsky et al. · APL Materials · 2020 · 101 citations · Full text

Engineering, β-Ga2o3 Thin Films, Crystal Growth Technology +17

Low temperature electron mobility exceeding 104 cm2/V s in MOCVD grown <b>β</b>-Ga2O3

Fikadu Alema, Yuewei Zhang, A. Osinsky et al. · APL Materials · 2019 · 94 citations · Full text

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