Rolf Custers

Progress in EUV resists towards high-NA EUV lithography

Xiaolong Wang, Zuhal Taşdemir, Iacopo Mochi et al. · 2019 · 19 citations · Full text

Engineering, Electrical Engineering, Manufacturing Engineering +13

State-of-the-art EUV materials and processes for the 7nm node and beyond

Elizabeth Buitrago, Marieke Meeuwissen, Oktay Yildirim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 17 citations · Full text

Engineering, Materials Engineering, Materials Science +13

Progress in EUV resists status towards high-NA EUV lithography

Xiaolong Wang, Li‐Ting Tseng, Timothée Allenet et al. · 2020 · 12 citations

Engineering, Electrical Engineering, Materials Science +13

Chemically-amplified EUV resists approaching 11 nm half-pitch

Iacopo Mochi, Karen Garrido Olvera, Marieke Meeuwissen et al. · 2018 · 11 citations · Full text

Natural Sciences, Manufacturing Engineering, Materials Science +13

Evaluation of EUV resists for 5nm technology node and beyond

Zuhal Taşdemir, Iacopo Mochi, Lidia van Lent-Protasova et al. · 2018 · 10 citations

Engineering, Electrical Engineering, Materials Science +11