Shailendra N. Srivastava

<i>In situ</i> collector cleaning and extreme ultraviolet reflectivity restoration by hydrogen plasma for extreme ultraviolet sources

Daniel T. Elg, J. Sporre, Gianluca Panici et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 37 citations

Ultraviolet Light, Engineering, Plasma Physics +20

LPP source system development for HVM

David C. Brandt, Igor V. Fomenkov, Alex I. Ershov et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 36 citations · Full text

Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching

Daniel T. Elg, Gianluca Panici, Sumeng Liu et al. · Plasma Chemistry and Plasma Processing · 2017 · 29 citations

Chemical Engineering, Optical Materials, Engineering +7

Three-dimensional refinement of the structure of anthrone

Shailendra N. Srivastava · Acta Crystallographica · 1964 · 26 citations

Axial Skeleton, Physiology, Biomechanics +4

Laser-produced plasma light source for EUVL

Igor V. Fomenkov, Alex I. Ershov, William N. Partlo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 22 citations

Electrical Engineering, Advanced Lithography Applications, Engineering +13