Philip C. W. Ng

Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects

Philip C. W. Ng · Journal of Micro/Nanolithography MEMS and MOEMS · 2011 · 23 citations

Optical Materials, Engineering, Electron-beam Lithography +19

Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam–direct-write lithography

Chun-Hung Liu, Philip C. W. Ng, Yu-Tian Shen et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2013 · 11 citations

Psf Accuracy, Electrical Engineering, Engineering +11

Model-based proximity effect correction for electron-beam direct-write lithography

Chun-Hung Liu, Pei-Lin Tien, Philip C. W. Ng et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 10 citations

Design of automatic controllers for model-based OPC with optimal resist threshold determination for improving correction convergence

Yi-Sheng Su, Philip C. W. Ng, Kuen-Yu Tsai et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 10 citations

Resist Model, Control Method, Engineering +13