Willard E. Conley

Negative photoresists for optical lithography

Jane M. Shaw, Jeffrey D. Gelorme, N. LaBianca et al. · IBM Journal of Research and Development · 1997 · 339 citations

Engineering, Chemistry, Materials Science +14

Liquid immersion lithography: evaluation of resist issues

William D. Hinsberg, Gregory M. Wallraff, Carl E. Larson et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 37 citations

Engineering, Materials Engineering, Materials Science +8

Contact hole reticle optimization by using interference mapping lithography (IML)

Robert Socha, Douglas J. Van Den Broeke, Stephen Hsu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 29 citations

Engineering, Manufacturing Engineering, Biomedical Optics +13

The Design of Resist Materials for 157nm Lithography.

C. Grant Willson, Brian C. Trinque, Brian Osborn et al. · Journal of Photopolymer Science and Technology · 2002 · 25 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Designing high performance KrF and ArF single layer resists with methacrylate polymers.

Robert D. Allen, Gregory M. Wallraff, William D. Hinsberg et al. · Journal of Photopolymer Science and Technology · 1993 · 17 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +11