Scott D. Hector - Concepedia

Author

Scott D. Hector

Motorola (United States)

Also Known As

S D Hector, S. D. Hector, S. Hector, S.D. Hector, Scott D. Hector, Scott Hector

Publications

664

Citations

H-Index

Concepts

All Affiliations

Motorola (United States)Sandia National Laboratories California Lawrence Livermore National Laboratory Intel (United States)Massachusetts Institute of Technology

About

Scott D. Hector is an author at Motorola (United States) specializing in microfabrication, applied physics, and engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	14	24	511
2	Applied Physics	14	21	440
3	Health Sciences	4	4	93
4	Computer Engineering	3	3	50
5	Education	1	1	12

Scott D. Hector

Publications

511

Citations

H-Index

Page 1

	Year	Citations
Review of progress in extreme ultraviolet lithography masks Scott D. Hector, Pawitter Mangat Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Ultraviolet LightAdded Defect DensityEngineeringElectron-beam LithographyWafer Scale Processing	2001	50
A new approach to high fidelity <i>e</i>-beam and ion-beam lithography based on an <i>i</i> <i>n</i> <i>s</i> <i>i</i> <i>t</i> <i>u</i> global-fiducial grid Henry I. Smith, Scott D. Hector, Mark L. Schattenburg, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyMicroscopyInterferometryOptical Metrology	1991	41
<title>System integration and performance of the EUV engineering test stand</title> Daniel A. Tichenor, Avijit K. Ray-Chaudhuri, William C. Replogle, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Engineering Test StandEngineeringElectron-beam LithographyMicroscopyOptic Design	2001	40
X-ray nanolithography: Extension to the limits of the lithographic process Henry I. Smith, Mark L. Schattenburg, Scott D. Hector, Microelectronic Engineering Materials ScienceEngineeringElectron-beam LithographyBeam LithographyNanomaterials	1996	35
EUVL masks: requirements and potential solutions Scott D. Hector Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyBeam LithographyElectronic PackagingHead-mounted Display	2002	33
Demonstration of pattern transfer into sub-100 nm polysilicon line/space features patterned with extreme ultraviolet lithography G. F. Cardinale, Craig C. Henderson, J. E. M. Goldsmith, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Optical MaterialsEngineeringElectron-beam LithographyPattern TransferOptoelectronic Devices	1999	30
Modeling and experimental verification of illumination and diffraction effects on image quality in x-ray lithography Scott D. Hector, Mark L. Schattenburg, Erik H. Anderson, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyMicroscopyComputational IlluminationPolycapillary Optics	1992	25
Critical dimension control in optical lithography Sergei V. Postnikov, Scott D. Hector, César M. Garza, Microelectronic Engineering EngineeringElectron-beam LithographyBeam LithographyMicrofabricationOptical Properties	2003	20
Status and future of X-ray lithography Scott D. Hector Microelectronic Engineering Materials ScienceEngineeringElectron-beam LithographyBeam LithographyMicrofabrication	1998	19
Extreme ultraviolet lithography mask patterning and printability studies with a Ta-based absorber Pawitter J. S. Mangat, Scott D. Hector, Michael A. Thompson, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Short Wavelength OpticOptical MaterialsEngineeringTa-based AbsorberElectron-beam Lithography	1999	19

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