Scott D. Hector

Review of progress in extreme ultraviolet lithography masks

Scott D. Hector, Pawitter Mangat · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 50 citations

Ultraviolet Light, Added Defect Density, Engineering +16

A new approach to high fidelity <i>e</i>-beam and ion-beam lithography based on an <i>i</i> <i>n</i> <i>s</i> <i>i</i> <i>t</i> <i>u</i> global-fiducial grid

Henry I. Smith, Scott D. Hector, Mark L. Schattenburg et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1991 · 41 citations

Engineering, Electron-beam Lithography, Microscopy +23

&lt;title&gt;System integration and performance of the EUV engineering test stand&lt;/title&gt;

Daniel A. Tichenor, Avijit K. Ray-Chaudhuri, William C. Replogle et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 40 citations

Engineering Test Stand, Engineering, Electron-beam Lithography +28

X-ray nanolithography: Extension to the limits of the lithographic process

Henry I. Smith, Mark L. Schattenburg, Scott D. Hector et al. · Microelectronic Engineering · 1996 · 35 citations

Materials Science, Engineering, Electron-beam Lithography +13

EUVL masks: requirements and potential solutions

Scott D. Hector · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 33 citations

Engineering, Electron-beam Lithography, Beam Lithography +18