T. E. Jewell

Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μm

J. E. Bjorkholm, Jeffrey Bokor, L. Eichner et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 158 citations

Optical Materials, X-ray Spectroscopy, Engineering +23

Excimer Laser-Based Lithography: A Deep Ultraviolet Wafer Stepper

Victor Pol, James H. Bennewitz, Gary C. Escher et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1986 · 67 citations

Reflective systems design study for soft x-ray projection lithography

T. E. Jewell, J. Michael Rodgers, Kevin P. Thompson · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 52 citations

Optical Materials, Engineering, Health Sciences +15

Soft-x-ray projection lithography: printing of 02-μm features using a 20:1 reduction

Dwight W. Berreman, John H. Bruning, J. E. Bjorkholm et al. · Optics Letters · 1990 · 33 citations

Compound Bragg reflection filters made by spatial frequency doubling lithography

C. H. Henry, Y. Shani, R. C. Kistler et al. · Journal of Lightwave Technology · 1989 · 23 citations

Spatial Frequency-doubling Lithography, Optical Materials, Engineering +18