Statistics
Publications
9
Citations
193
H-Index
9
Active since
2004
Thomas Cecil is an author at Luminex (United States) specializing in engineering, mask design, and design optimization.
Publications per year
2004–2022
9
9
Inverse lithography technology (ILT): keep the balance between SRAF and MRC at 45 and 32 nm
Linyong Pang, Yong Liu, Thuc Dam et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 22 citations
Engineering, Manufacturing Engineering, Design Automation +14
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